Porous silicon offers remarkable optical properties which have a wide range of applications. A method to predict the reflectance of arbitrarily etched porous silicon structures using a numerical thin film model is posed. Porous silicon samples were created using an anodization cell of our design and reflectance measurements were compared to the model. The theoretical reflectance curves show a promising correlation to the actual data. More samples including AC etched ones need to be created and characterized using more precise methods in order to further validate the modeling method.
